Full-wafer mapping of total and ionized EL2 concentration in semi-insulating GaAs using infrared absorption
- 4 December 1989
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 55 (23) , 2426-2428
- https://doi.org/10.1063/1.102015
Abstract
By combining infrared absorption data taken at two different wavelengths in the spectral region in which the native deep donor EL2 absorbs in GaAs, it is possible to determine the distribution of the total EL2 concentration and its filled fraction across a semi-insulating GaAs substrate. The distributions of net shallow acceptor concentration and free-electron concentration can then be deduced. Full-wafer maps of these quantities for a semi-insulating GaAs wafer are displayed along with Hall effect measurements which confirm the patterns observed optically.Keywords
This publication has 8 references indexed in Scilit:
- Hole photoionization cross sections of EL2 in GaAsApplied Physics Letters, 1988
- Effect of crystal stoichiometry on activation efficiency in Si implanted, rapid thermal annealed GaAsApplied Physics Letters, 1986
- Effects of macroscopic inhomogeneities on electron mobility in semi-insulating GaAsJournal of Applied Physics, 1986
- Experimental requirements for quantitative mapping of midgap flaw concentration in semi-insulating GaAs wafers by measurement of near-infrared transmittanceJournal of Applied Physics, 1985
- Direct observation of the principal deep level (EL2) in undoped semi-insulating GaAsApplied Physics Letters, 1983
- Compensation Mechanism in Liquid Encapsulated Czochralski GaAs: Importance of Melt StoichiometryIEEE Transactions on Microwave Theory and Techniques, 1982
- Optical assessment of the main electron trap in bulk semi-insulating GaAsApplied Physics Letters, 1981
- Compensation mechanisms in GaAsJournal of Applied Physics, 1980