Molecular-beam study of gas-surface chemistry in the ion-assisted etching of silicon with atomic and molecular hydrogen and chlorine
- 1 May 1990
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 8 (3) , 1969-1976
- https://doi.org/10.1116/1.576790
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: