In situ monitoring of wafer charging during ion implantation

• 1 February 1989
• journal article
• Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
• Vol. 37-38, 568-571
• https://doi.org/10.1016/0168-583x(89)90248-6

Abstract

Keywords

• ION IMPLANTATION
• WAFER CHARGING
• SITU MONITORING
• MONITORING OF WAFER