A Pattern Deformational Model and Bayes Error-Correcting Recognition System
- 1 January 1979
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Systems, Man, and Cybernetics
- Vol. 9 (12) , 745-756
- https://doi.org/10.1109/tsmc.1979.4310126
Abstract
A pattern deformational model is proposed in this paper. Pattern deformations are categorized into two types: local deformation and structural deformation. A structure-preserving local deformation can be decomposed into a syntactic deformation followed by a semantic deformation, the former being induced on primitive structures and the latter on primitive properties. Bayes error-correcting parsing algorithms are proposed accordingly which not only can perform normal syntax analysis but also can make statistical decisions. An optimum Bayes error-correcting recognition system is then formulated for pattern classification. The system can be considered as a hybrid pattern classifier which uses both syntactic and statistical pattern recognition techniques.Keywords
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