Pulsed plasma-enhanced chemical vapor deposition from hexafluoropropylene oxide: Film composition study

• 22 February 1998
• journal article
• research article
• Published by Wiley in Journal of Applied Polymer Science
• Vol. 67  (8) , 1489-1502
• https://doi.org/10.1002/(sici)1097-4628(19980222)67:8<1489::aid-app14>3.0.co;2-x

Abstract

Keywords

• MODEL
• PLASMA
• SUBSTRATE TEMPERATURE
• CF2
• DEPOSITED FILMS
• HFPO
• THAN SIMPLY
• SIMPLY DUTY
• DETERMINING FILM COMPOSITION