Preparation of Si–C Films by Plasma Deposition Process with Neutralization

• 1 September 1978
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 17  (9) , 1693-1694
• https://doi.org/10.1143/jjap.17.1693

Abstract

Keywords

• DEPOSITION PROCESS
• PLASMA DEPOSITION
• FILMS
• PREPARATION OF SI
• NEUTRALIZATION