Nanofabrication of advanced waveguide structures incorporating a visible photonic band gap
- 1 June 1998
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 8 (2) , 172-176
- https://doi.org/10.1088/0960-1317/8/2/033
Abstract
In this paper, we present the nanofabrication of novel semiconductor waveguide devices incorporating a photonic band structure within the guiding core layer. Our devices are based on a two-dimensional triangular array of air holes etched through the cladding and core layers of a blanket silicon nitride waveguide. These are then micromachined to create unusual pore profiles with features as small as 30 nm. We demonstrate a polarization dependent photonic band gap in the visible region of the spectrum.Keywords
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