Microstructures of Pt/Co Films Deposited on Sputter-Etched Underlayers

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Abstract
Pt/Co multilayered films deposited on a sputter-etched SiN underlayer show larger magnetic anisotropy (1×106 erg/cm3) and better squareness(=1) than those on nonetched underlayers. The results of small-angle X-ray diffraction indicate the improvement of the multilayer structural order due to the etching. According to the transmission electron microscopy observation and the electrical resistivity measurement, the etching of underlayers transforms the Pt/Co films from island structure to continuous structure in an early stage of film growth. The scanning tunneling microscopy observation suggests that the sputter etching flattens the surface of the underlayer.