Characteristics of Si ‐ SiO2 Interfaces Beneath Thin Silicon Films Defined by Electrochemical Etching
- 1 April 1975
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 122 (4) , 557-560
- https://doi.org/10.1149/1.2134259
Abstract
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