Influence of the substrate temperature and the discharge voltage on the structure of titanium films produced by ion-plating
- 1 January 1980
- Vol. 30 (7) , 255-260
- https://doi.org/10.1016/s0042-207x(80)80036-4
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974
- The Effect of Substrate Temperature on the Structure of Titanium Carbide Deposited by Activated Reactive EvaporationJournal of Vacuum Science and Technology, 1972