Preparation of Al2O3 films by a new CVD process combining plasma and accelerated ion beams
- 1 May 1996
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 112 (1-4) , 280-283
- https://doi.org/10.1016/0168-583x(95)01428-4
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Ion-Beam-Assisted Deposition and SynthesisMRS Bulletin, 1987
- A new machine for metal surface treatment by dynamic mixing using a high current ion sourceJournal of Vacuum Science & Technology A, 1986
- Effects of internal and external magnetic fields on the characteristics of a magnetic multipole plasma sourceReview of Scientific Instruments, 1986