Low-temperature vapour deposition of high-purity copper coatings from bis[N-(fluoroalkyl)salicylaldiminato]copper chelates
- 1 January 1991
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of Materials Chemistry
- Vol. 1 (4) , 701-702
- https://doi.org/10.1039/jm9910100701
Abstract
High-purity copper coatings have been prepared by chemical vapour deposition at low temperature from two nove bis[N-(fluoroalkyl)salicylaldiminato] chelates of copper(II). When hydrogen is used as the carrier gas at ambient pressure, copper coatings containing < 1 atom.% carbon, oxygen, nitrogen, and fluorine are generated at 290 and 330 °C using Cu(NCH2CF2CF3-SAL)2 and Cu(NCH2CF2CF2CF3-SAL)2, respectively (SAL = salicylaldiminato). When the deposition is carried out in vacuo, ca. 6% carbon, 2% oxygen, and 3% fluorine are incorporated into the films using Cu(NCH2CF2CF3-SAL)2 as the copper source.Keywords
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