Characterization of Thin Anodized Films on Aluminum with Soft X‐ray Spectroscopy

Abstract
Two methods utilizing x‐ray spectra from the electron microbeam probe for the determination of aluminum oxide film thickness for a broad range of thicknesses are described. One method uses the direct measurement of oxygen K emission while the other uses the changes in fine features of the x‐ray spectra with changes in oxide film thickness. For oxides formed by barrier anodization technique, films as thin as 20–30Å and as thick as several thousand angstroms could be measured by these methods.

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