Electron Field Emission from Chemical Vapor Deposited Diamond Films

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Abstract
Electron field emission from diamond polycrystalline films fabricated by chemical vapor deposition has been studied. Emission properties of the films are shown to vary in a wide range, depending on the deposition conditions. The minimal value of the initial field at which emission current has been detected was about 0.5 V/μm. The emission currents reached values of 1.5 mA/cm2 at a field of 10 V/μm. The films were characterized by Raman spectroscopy, electron diffraction, atomic force microscopy, cathodoluminescence, and optical absorption spectroscopy. We established a correlation between the emission characteristics of the films and their crystalline structure. The lowest initial fields were obtained for diamond films with strongly disordered structure, composed of nanometer size diamond and graphite crystallites. Electron emission is likely to the “nondiamond” carbon phase incorporated into the diamond matrix.

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