4 Gbit/in.2 inductive write heads using high moment FeAlN poles

Abstract
Thin film inductive write heads incorporating 2‐μm‐thick single and multilayer FeAlN/SiO2 poles were fabricated. The poles were trimmed to 1 μm trackwidth using focused ion beam etching from the air bearing surface of the sliders. Tests on 2950 Oe media show satisfactory media saturation. Overwrite in excess of −43 dB and hard transition peak shift 2