TiSi2 phase transformation characteristics on narrow devices
- 1 December 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 290-291, 469-472
- https://doi.org/10.1016/s0040-6090(96)09023-2
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2/IEEE Transactions on Electron Devices, 1991
- Metastable phase formation in titanium-silicon thin filmsJournal of Applied Physics, 1985