Two-Photon Diffraction and Quantum Lithography
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- 14 June 2001
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 87 (1) , 013602
- https://doi.org/10.1103/physrevlett.87.013602
Abstract
We report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have beaten the classical diffraction limit by a factor of 2. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.Keywords
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This publication has 9 references indexed in Scilit:
- Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction LimitPhysical Review Letters, 2000
- Experimental Realization of Popper's Experiment: Violation of the Uncertainty Principle?Foundations of Physics, 1999
- Theory of the three-photon entangled statePhysical Review A, 1998
- Interference effects in spontaneous two-photon parametric scattering from two macroscopic regionsPhysical Review A, 1997
- Optical imaging by means of two-photon quantum entanglementPhysical Review A, 1995
- Theoretical basis for a new subnatural spectroscopy via correlation interferometryLetters in Mathematical Physics, 1995
- Observation of Two-Photon “Ghost” Interference and DiffractionPhysical Review Letters, 1995
- Quantum ElectronicsAmerican Journal of Physics, 1968
- Can Quantum-Mechanical Description of Physical Reality Be Considered Complete?Physical Review B, 1935