Appearance of vertical dihydrides on a silicon surface while dissolving the surface oxide layer in hot water
- 3 April 1995
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 66 (14) , 1797-1799
- https://doi.org/10.1063/1.113325
Abstract
Removal of surface oxides from a partially oxidized Si(111) surface, and simultaneous termination of the new dangling bonds by hydrogen in hot water with a 0.004 ppm concentration of dissolved oxygen, was observed. During removal for up to 60 min, vertical dihydrides at step edges appeared on the hydrogen-terminated surface. From observing selective removal of vertical dihydrides from an oxygen-free hydrogen-terminated surface, the appearance of vertical dihydrides at step edges shows the existence of the dihydride creation reaction, while the oxides are dissolved in water.Keywords
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