Synthesis and characterization of crystalline films on silicon
- 4 November 1996
- journal article
- letter
- Published by IOP Publishing in Journal of Physics: Condensed Matter
- Vol. 8 (45) , L685-L690
- https://doi.org/10.1088/0953-8984/8/45/005
Abstract
We report the successful experimental synthesis of nearly pure crystalline - and films on a Si(100) substrate by bias-assisted hot-filament chemical vapour deposition. Scanning electron microscopy shows that the substrate surface is covered by polycrystalline clusters in size with a density of . Relative N/C compositions in the range 1.34 - 2.5 were obtained by energy-dispersive x-ray analysis. The lattice parameters a = 7.06 Å and c = 2.72 Å for , and a = 6.48 Å and c = 4.71 Å for were determined both by x-ray diffraction and by transmission electron microscopy. A buffer layer of was found.Keywords
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