Metallurgical aspects of the formation of silicides
- 1 June 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 140 (1) , 3-22
- https://doi.org/10.1016/0040-6090(86)90154-9
Abstract
No abstract availableThis publication has 27 references indexed in Scilit:
- The film compounds in planar PtSi reactionJournal of Physics and Chemistry of Solids, 1985
- Refractory metal silicides: Thin-film properties and processing technologyIEEE Transactions on Electron Devices, 1983
- Reinvestigation of first phase nucleation in planar metal-Si reaction couplesApplied Physics Letters, 1983
- Metallization for very-large-scale integrated circuitsThin Solid Films, 1982
- Thermal stability of Pd2Si and PdSi in thin film and in bulk diffusion couplesJournal of Applied Physics, 1982
- Compounds in the Pd-Si and Pt-Si system obtained by electron bombardment and post-thermal annealingJournal of Applied Physics, 1981
- Sequence of phase formation in planar metal-Si reaction couplesApplied Physics Letters, 1981
- Reversible phase transformation in the Pd2Si-PdSi thin-film systemApplied Physics Letters, 1980
- Pt2Si and PtSi formation with high-purity Pt thin filmsApplied Physics Letters, 1977
- First phase nucleation in silicon–transition-metal planar interfacesApplied Physics Letters, 1976