Monte Carlo-fluid model of chlorine atom production in Cl2, HCl, and CCl4 radio-frequency discharges for plasma etching
- 1 September 1992
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 10 (5) , 2179-2187
- https://doi.org/10.1116/1.586186
Abstract
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