Coevaporation with a rate control system based on a quadrupole mass spectrometer

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Abstract
In a deposition system designed for coevaporation, the control of the individual evaporation rates is the crucial point. This paper describes a deposition system where the evaporation rates of three resistively heated elemental sources are controlled by utilizing a quadrupole mass spectrometer. The rate monitoring and control system is characterized for the case of CuInSe2 deposition, where it is shown that a precise control of the properties of the deposited film can be achieved. The results reported are of general interest, and neither restricted to three elements nor to the specific elements used in the case studied.

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