Reactive ion etching of epitaxial ZnSe thin films

• 1 November 1988
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 6  (6) , 1889-1891
• https://doi.org/10.1116/1.584195

Abstract

Keywords

• ZINC
• REACTIVE ION ETCHING
• CHEMICAL REACTION
• CHEMICAL REACTIONS
• INTEGRATED CIRCUITS
• MULTIPLE LINEAR REGRESSION
• ROOM TEMPERATURE
• OPTIMIZATION
• HALIDES
• THIN FILM
• FABRICATION
• CATHODOLUMINESCENCE
• INTEGRATED CIRCUIT
• ETCHING
• THIN FILMS
• FILMS
• CHARGED PARTICLES
• ELECTRONIC CIRCUITS
• IONS
• LUMINESCENCE