The effect of deposition rate on the electrical resistivity of thin manganese films
- 14 August 1980
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 13 (8) , L157-L159
- https://doi.org/10.1088/0022-3727/13/8/003
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Electrical resistance studies of yttrium and the yttrium-hydrogen systemThin Solid Films, 1979
- Electrical resistivity of ytterbium thin filmsThin Solid Films, 1973
- Temperature Coefficient of Resistance in Thin Vanadium FilmsJournal of Applied Physics, 1968
- The mean free path of electrons in metalsAdvances in Physics, 1952
- The conductivity of thin metallic films according to the electron theory of metalsMathematical Proceedings of the Cambridge Philosophical Society, 1938