Computer-controlled scanning electron microscope system for high-resolution microelectronic pattern fabrication
- 1 May 1972
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 19 (5) , 624-628
- https://doi.org/10.1109/t-ed.1972.17463
Abstract
A small, dedicated computer has been interfaced to a scanning electron microscope (SEM) for the purpose of generating, registering, and fabricating microelectronic device and circuit patterns with submicron dimensions. A preliminary registration accuracy of ±0.1 µm over a (950-µm)2pattern field has been demonstrated.Keywords
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