Efficient injection locking of an e-beam-excited XeF laser
- 1 August 1981
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 52 (8) , 5383-5385
- https://doi.org/10.1063/1.329400
Abstract
Narrowband ultraviolet radiation from a frequency-doubled dye laser has been used to control the linewidth and polarization of a long pulse length, electron-beam-excited XeF laser. Linewidths of 0.004 nm have been achieved in the 353-nm band of the XeF B→X laser transition. Over 90% of the energy in the free-running laser pulse has been extracted in the narrowband injection-locked pulse. Ratios of injection signal power to output laser power on the order of 1:5000 are adequate for efficient injection-locking to occur.This publication has 8 references indexed in Scilit:
- Control of XeF laser output by pulse injectonApplied Physics Letters, 1980
- Temperature-dependent absorption processes in the XeF laserApplied Physics Letters, 1979
- Theoretical analysis of the electrically excited KrF laserApplied Physics Letters, 1978
- Injection locking of a xenon fluoride laserApplied Physics Letters, 1977
- The influence of diluent gas on the XeF laserApplied Physics Letters, 1977
- High-power xenon fluoride laserApplied Physics Letters, 1975
- Table-top Ar-N2 laserApplied Physics Letters, 1975
- Laser injection lockingProceedings of the IEEE, 1973