Initial pits for electrochemical etching in hydrofluoric acid
- 25 August 2000
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 85 (1-3) , 390-394
- https://doi.org/10.1016/s0924-4247(00)00430-1
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Fabrication of free standing structure using single step electrochemical etching in hydrofluoric acidSensors and Actuators A: Physical, 1999
- Macroporous silicon formation for micromachiningPublished by SPIE-Intl Soc Optical Eng ,1997
- Formation Mechanism and Properties of Electrochemically Etched Trenches in n‐Type SiliconJournal of the Electrochemical Society, 1990
- Electropolishing Silicon in Hydrofluoric Acid SolutionsJournal of the Electrochemical Society, 1958