Mechanism of silicon surface roughening by reactive ion etching
- 1 December 1986
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 8 (6) , 243-246
- https://doi.org/10.1002/sia.740080604
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Plasma-Assisted Etching in MicrofabricationAnnual Review of Materials Science, 1983
- Electron spectroscopy study of silicon surfaces exposed to XeF2 and the chemisorption of SiF4 on siliconJournal of Applied Physics, 1980
- Competitive Mechanisms in Reactive Ion Etching in a CF 4 PlasmaJournal of the Electrochemical Society, 1979
- Glow Discharge Phenomena in Plasma Etching and Plasma DepositionJournal of the Electrochemical Society, 1979