An organosilicon photoresist for use in excimer laser lithography

• 31 December 1987
• journal article
• Published by Elsevier in Microelectronic Engineering
• Vol. 6  (1-4) , 393-398
• https://doi.org/10.1016/0167-9317(87)90064-5

Abstract

Keywords

• ORGANOSILICON PHOTORESIST
• LASER LITHOGRAPHY
• EXCIMER LASER
• PHOTORESIST FOR USE