19.4: Low Temperature PECVD a‐Si:H TFT for Plastic Substrates
- 1 May 2000
- journal article
- Published by Wiley in SID Symposium Digest of Technical Papers
- Vol. 31 (1) , 278-281
- https://doi.org/10.1889/1.1832937
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Mn K-Edge X-Ray Absorption Spectroscopic Study of Mn-Doped Zn2SiO4 PhosphorsJournal of Materials Science Letters, 1999
- Dominant monohydride bonding in hydrogenated amorphous silicon thin films formed by plasma enhanced chemical vapor deposition at room temperatureJournal of Vacuum Science & Technology A, 1997
- Dependence of hydrogen diffusion on growth conditions in hydrogenated amorphous siliconPhilosophical Magazine Part B, 1988
- Microstructure of plasma-deposited a-Si : H filmsApplied Physics Letters, 1979