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Local Etch‐Rate Control of Masked InP / InGaAsP by Diffusion‐Limited Etching
Home
Publications
Local Etch‐Rate Control of Masked InP / InGaAsP by Diffusion‐Limited Etching
Local Etch‐Rate Control of Masked InP / InGaAsP by Diffusion‐Limited Etching
TB
T. Brenner
T. Brenner
HM
H. Melchior
H. Melchior
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1 July 1994
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 141
(7)
,
1954-1956
https://doi.org/10.1149/1.2055034
Abstract
No abstract available
Cited
Cited by 14 articles
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