Point-defect equilibrium during diffusion of purely substitutional impurities into elemental crystals
- 15 September 1990
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 42 (9) , 5793-5801
- https://doi.org/10.1103/physrevb.42.5793
Abstract
Diffusion of exclusively substitutional solutes (B) into elemental metallic or semiconducting matrices via exchanges with vacancies (V) is treated by starting from a quasichemical reaction which includes impurity-vacancy pairs (BV) as a third species, i.e., BV⇄B+V. This approach enables us to answer the question whether during foreign-atom penetration the vacancy concentration of the host crystal remains in thermal equilibrium. Within the present concepts a distinction can be made between the BV-controlled and the V-controlled mode of the vacancy mechanism. It is shown that commonly the former case, in which vacancy equilibrium persists, is realized. In the V-controlled case the B incorporation is limited by the removal of excess isolated vacancies originating from dissociation of BV pairs. Conditions for the appearance of this diffusion mode are pointed out. We also discuss the role of dislocations as vacancy sinks, the validity of the mass-action law associated with the above reaction, and a possible influence of self-interstitials.Keywords
This publication has 19 references indexed in Scilit:
- On Diffusion by the Dissociative Mechanism in the Case of a Finite Foreign‐Atom SourcePhysica Status Solidi (b), 1990
- Kick-out diffusion of zinc in silicon at 1262 KJournal of Physics: Condensed Matter, 1989
- On the Determination of Enhancement Factors of Solvent DiffusionPhysica Status Solidi (b), 1989
- Point defects and dopant diffusion in siliconReviews of Modern Physics, 1989
- Diffusion and Solubility of Platinum in SiliconMaterials Science Forum, 1989
- Diffusion and solubility of copper in germaniumJournal of Applied Physics, 1985
- Diffusion of gold in silicon studied by means of neutron-activation analysis and spreading-resistance measurementsApplied Physics A, 1984
- Mechanism and kinetics of the diffusion of gold in siliconApplied Physics A, 1980
- On the theory of the diffusion of gold into siliconPhysica Status Solidi (a), 1980
- Solute diffusion in dilute alloysJournal of Nuclear Materials, 1978