Large-Area High-Speed Diamond Deposition by Rf Induction Thermal Plasma Chemical Vapor Deposition Method
- 1 March 1993
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 32 (3B) , L438
- https://doi.org/10.1143/jjap.32.l438
Abstract
No abstract availableKeywords
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