Characterization of Ti/TiN Films and SiO2/Ti Interfaces by Use of X-Ray Photoelectron Spectroscopy
- 1 January 1993
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- NIST x-ray photoelectron spectroscopy (XPS) databasePublished by National Institute of Standards and Technology (NIST) ,1990
- Phase equilibria in thin-film metallizationsJournal of Vacuum Science & Technology B, 1984
- Principles of Instrumental AnalysisStudies in Conservation, 1973