Localization in the metallic regime of granular Cu—SiO2 films
- 30 April 1982
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 42 (2) , 143-145
- https://doi.org/10.1016/0038-1098(82)90370-2
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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