Stability of SiC-masks for high resolution synchrotron X-ray lithography

• 31 December 1986
• journal article
• Published by Elsevier in Microelectronic Engineering
• Vol. 5  (1-4) , 39
• https://doi.org/10.1016/0167-9317(86)90027-4

Abstract

Keywords

• SYNCHROTRON X
• HIGH RESOLUTION
• RESOLUTION SYNCHROTRON
• RAY LITHOGRAPHY
• SIC MASKS
• STABILITY OF SIC