Effect of Reactant Nitrogen Pressure on the Microstructure and Properties of Reactively Sputtered Silicon Nitride Films
- 1 June 1975
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 122 (6) , 815-822
- https://doi.org/10.1149/1.2134329
Abstract
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