Application of a MeV nickel ion beam for PIXE analysis of iron near the surface of a silicon wafer
- 1 May 1995
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 100 (1) , 122-124
- https://doi.org/10.1016/0168-583x(95)00005-4
Abstract
No abstract availableKeywords
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