Mechanics of the ion layer gas reaction–A preparation method of nanocrystalline thin layers
- 15 May 2002
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 91 (10) , 6691-6694
- https://doi.org/10.1063/1.1464649
Abstract
Nanocrystalline CdS thin layers can be prepared using the ion layer gas reaction (ILGAR), a low-cost deposition technique for compound semiconductor thin films. We investigated the layers by optical spectroscopy and transmission electron microscopy, and found that lower precursor concentrations and thicker films favor larger nanoparticles and a lower band gap energy, whereby the concentration effect is more pronounced. The nucleation mechanism of the precursor seems to determine the particle size and the probability of its growth. A minimum CdS particle diameter of 4.7 nm has been extrapolated, which corresponds to an optical band gap energy of 2.83 eV, as a result of quantum confinement. ILGAR enables deposition of nanoparticles of controlled size.
This publication has 7 references indexed in Scilit:
- ILGAR – A novel thin-film technology for sulfidesSolar Energy Materials and Solar Cells, 2000
- A novel deposition technique for compound semiconductors on highly porous substrates: ILGARThin Solid Films, 2000
- Size-quantized CdS films in thin film CuInS2 solar cellsApplied Physics Letters, 1998
- Incorporation of Cadmium Sulfide into Nanoporous Silicon by Sequential Chemical Deposition from SolutionJournal of the Electrochemical Society, 1998
- Optical properties of CdS nanocrystalline films prepared by a precipitation techniqueThin Solid Films, 1998
- Photochemistry of colloidal semiconductors. Onset of light absorption as a function of size of extremely small CdS particlesChemical Physics Letters, 1986
- Electron–electron and electron-hole interactions in small semiconductor crystallites: The size dependence of the lowest excited electronic stateThe Journal of Chemical Physics, 1984