Semiconductor on glass photocathodes for high throughput maskless electron beam lithography
- 1 November 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (6) , 2707-2712
- https://doi.org/10.1116/1.589712
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- The Stanford linear accelerator polarized electron sourceNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1995
- Negative electron affinity photocathodes as high-performance electron sources-Part 2: Energy spectrum measurementsPublished by SPIE-Intl Soc Optical Eng ,1995
- Negative electron affinity photocathodes as high-performance electron sources. Part 1: achievement of ultrahigh brightness from an NEA photocathodePublished by SPIE-Intl Soc Optical Eng ,1995