DEPTH RESOLUTION IN ION SPUTTERING - AN ASPECT OF QUANTITATIVEMICROANALYSIS

1 February 1984

journal article
Published by EDP Sciences in Le Journal de Physique Colloques

Vol. 45 (C2) , C2-115
https://doi.org/10.1051/jphyscol:1984226

Abstract

The depth resolution of sputter depth profiling has beenanalysed using Ni-Cr multilayer structures. A new method has been developed toquantify the results. The depth resolution measured using polycrystallinemetallic layers is strongly influenced by mutual diffusion of thelayers

Keywords

DEPTH RESOLUTION
ION SPUTTERING
ASPECT OF QUANTITATIVEMICROANALYSIS
RESOLUTION IN ION

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