Submicrometre lift-off line with T-shaped cross-sectional form
- 11 June 1981
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 17 (12) , 429-430
- https://doi.org/10.1049/el:19810298
Abstract
A fine metal line with T-shaped cross-sectional form was fabricated by a lift-off technique using the double-layer electron beam resist method. The minimum lower and upper widths of the T-shaped cross-section were 0.2 μm and 0.7 μm, respectively, and, keeping the lower width within 0.3 μm, we could increase the upper width at will.Keywords
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