The effect of annealing temperature on the statistical properties of WO3surface
- 1 September 2006
- journal article
- Published by IOP Publishing in Journal of Statistical Mechanics: Theory and Experiment
- Vol. 2006 (09) , P09017
- https://doi.org/10.1088/1742-5468/2006/09/p09017
Abstract
No abstract availableKeywords
All Related Versions
This publication has 31 references indexed in Scilit:
- Influence of Coloring Voltage and Thickness on Electrochromical Properties of e-beam Evaporated WO[sub 3] Thin FilmsJournal of the Electrochemical Society, 2006
- Tunable electrochromic photonic crystalsApplied Physics Letters, 2005
- Room-temperature semiconductor gas sensor based on nonstoichiometric tungsten oxide nanorod filmApplied Physics Letters, 2005
- Structural and optical characterization of WO3 thin films for gas sensor applicationsJournal of Applied Physics, 2005
- Influence of the substrate on the electrochromic characteristics of lithiated α-WO3 layersSurface Science, 2004
- W O 3 ∕ metal thin-film bilayered structures as optical recording materialsJournal of Applied Physics, 2004
- Structural analysis of pure and LiCF3SO3-doped amorphous WO3 electrochromic films and discussion on coloration kineticsJournal of Applied Physics, 2004
- Properties of metal doped tungsten oxide thin films for NOx gas sensors grown by PLD method combined with sputtering processSensors and Actuators B: Chemical, 2004
- Photochromic properties of WO3 and WO3:X (X=Ti, Nb, Ta and Zr) thin filmsSolid State Ionics, 2003
- Gasochromic mechanism in a-WO3 thin films based on Raman spectroscopic studiesJournal of Applied Physics, 2000