Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films

• 4 July 2002
• journal article
• research article
• Published by Wiley in Chemical Vapor Deposition
• Vol. 8  (4) , 163-170
• https://doi.org/10.1002/1521-3862(20020704)8:4<163::aid-cvde163>3.0.co;2-v

Abstract

Keywords

• ALKOXIDE LIGANDS DONOR‐FUNCTIONALIZED
• HAFNIUM DIOXIDE
• LIQUID INJECTION
• MOCVD
• ZIRCONIUM DIOXIDE