FIELD-INDUCED SURFACE REARRANGEMENT IN A FIELD-ION MICROSCOPE
- 1 September 1970
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 17 (5) , 206-208
- https://doi.org/10.1063/1.1653367
Abstract
Adsorption of nitrogen on tungsten at 78°K was studied in a field‐ion microscope equipped with a channel‐plate image intensifier. Field‐induced surface rearrangement was observed using argon as the image gas. The changes in the field‐ion pattern are attributed to surface diffusion of tungsten‐nitrogen complexes.Keywords
This publication has 11 references indexed in Scilit:
- CHANNEL PLATE IMAGE CONVERTER IN ARGON FIELD-ION MICROSCOPYApplied Physics Letters, 1969
- Promoted field desorptionSurface Science, 1969
- Use of a channelled image intensifier in the field-ion microscopeJournal of Physics E: Scientific Instruments, 1969
- ON THE IONIZATION STATE OF FIELD EVAPORATED ATOMS AS MEASURED IN THE FIM-ATOM PROBEApplied Physics Letters, 1968
- The Atom-Probe Field Ion MicroscopeReview of Scientific Instruments, 1968
- The enhancement by inert gases of the field desorption of oxygen from tungstenBritish Journal of Applied Physics, 1967
- Adsorption of Nitrogen on Single-Crystal Faces of TungstenThe Journal of Chemical Physics, 1967
- Chemisorption and surface corrosion in the tungsten + carbon monoxide system, as studied by field emission and field ion microscopyDiscussions of the Faraday Society, 1966
- Chemisorption on single crystal planesDiscussions of the Faraday Society, 1966
- Direct Observation of Individual Adatoms: Nitrogen on TungstenThe Journal of Chemical Physics, 1962