Abstract
This paper reviews the rapidly emerging field of excimer laser lithography. Beginning with the first contact printing experiments, developments in excimer laser projection printing on various commercial lithographic machines are reviewed. Recent results obtained with full-field scanning projection systems as well as step-and-repeat tools are summarized. Future directions in optical lithography are examined in view of these advances. Finally, a discussion of various key excimer laser parameters is presented from two points of view: availability, and requirements for various practical lithographic systems.

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