Chemical vapour deposition promoted by r.f. discharge
- 1 August 1965
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 8 (8) , 653-654
- https://doi.org/10.1016/0038-1101(65)90033-x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Glow Discharge Formation of Silicon Oxide and The Deposition of Silicon Oxide Thin Film Capacitors by Glow Discharge TechniquesJournal of the Electrochemical Society, 1965
- Dielectric Properties of Cross-linked Polystyrene Film formed in the Glow DischargeNature, 1963
- Electrical Properties of Thin Organic FilmsJournal of the Electrochemical Society, 1963
- Silicon nitrides: Some physico‐chemical propertiesJournal of Chemical Technology & Biotechnology, 1958