Structure and properties of deposits grown by ion-beam-activated vacuum deposition techniques
- 15 October 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 63 (1) , 77-85
- https://doi.org/10.1016/0040-6090(79)90103-2
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Influence of ion bombardment on the properties of vacuum-evaporated thin filmsThin Solid Films, 1976
- Ion beam studies Part I: The retardation of ion beams to very low energies in an implantation acceleratorNuclear Instruments and Methods, 1976
- Thin film deposition using low-energy ion beams. I. System specification and designJournal of Vacuum Science and Technology, 1976
- Structure/property relationships in evaporated thick films and bulk coatingsJournal of Vacuum Science and Technology, 1974
- Fundamentals of Ion PlatingJournal of Vacuum Science and Technology, 1973