Formation Process of SnO2 Thin Films by Sol-Gel Method
- 1 January 1993
- journal article
- Published by Ceramic Society of Japan in Journal of the Ceramic Society of Japan
- Vol. 101 (1172) , 451-455
- https://doi.org/10.2109/jcersj.101.451
Abstract
Tin Oxide thin films were prepared by sol-gel method using colloidal particles derived from an inorganic salt. The thickness (t) of SnO2 films and the pulling rates (v) of substrates from dipping solutions were correlated with an expression of t∝v0.53. The formation process of SnO2 thin films was studied. Well-crystallized SnO2 thin films were obtained above 550°C after successive dehydration of OH groups. SnO2 thin films prepared at 550°C were composed of very fine particles with 10-20nm in diameter. Firing at higher temperatures caused the grain growth without substantial densification of the films, leading to coarse microstructure.Keywords
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