Substrate treatment and film deposition in ionized gases

• 1 October 1974
• journal article
• Published by Elsevier in Vacuum
• Vol. 24  (10) , 481
• https://doi.org/10.1016/0042-207x(74)90011-6

Abstract

Keywords

• SUBSTRATE TREATMENT
• IONIZED GASES
• FILM DEPOSITION
• DEPOSITION IN IONIZED